diff options
| author | Sylwester Nawrocki <s.nawrocki@samsung.com> | 2013-03-14 07:01:24 -0300 |
|---|---|---|
| committer | Mauro Carvalho Chehab <mchehab@redhat.com> | 2013-03-31 10:55:19 -0300 |
| commit | fc39f46b54b600f053bf9bab757023344e97925e (patch) | |
| tree | 43c702bd3b9f5d6765a0f67c5f03ec3ae2d57a41 /include/uapi/linux/v4l2-controls.h | |
| parent | 4163851f7b997e24602cad8e0eae96d31a252548 (diff) | |
[media] V4L: Add MATRIX option to V4L2_CID_EXPOSURE_METERING control
This patch adds a menu option to the V4L2_CID_EXPOSURE_METERING
control for multi-zone metering.
Signed-off-by: Sylwester Nawrocki <s.nawrocki@samsung.com>
Signed-off-by: Kyungmin Park <kyungmin.park@samsung.com>
Signed-off-by: Mauro Carvalho Chehab <mchehab@redhat.com>
Diffstat (limited to 'include/uapi/linux/v4l2-controls.h')
| -rw-r--r-- | include/uapi/linux/v4l2-controls.h | 1 |
1 files changed, 1 insertions, 0 deletions
diff --git a/include/uapi/linux/v4l2-controls.h b/include/uapi/linux/v4l2-controls.h index 7da22cec30c..69bd5bb0d5a 100644 --- a/include/uapi/linux/v4l2-controls.h +++ b/include/uapi/linux/v4l2-controls.h @@ -658,6 +658,7 @@ enum v4l2_exposure_metering { V4L2_EXPOSURE_METERING_AVERAGE = 0, V4L2_EXPOSURE_METERING_CENTER_WEIGHTED = 1, V4L2_EXPOSURE_METERING_SPOT = 2, + V4L2_EXPOSURE_METERING_MATRIX = 3, }; #define V4L2_CID_SCENE_MODE (V4L2_CID_CAMERA_CLASS_BASE+26) |